Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond
(Author) Guilei Wang
Format:
Paperback
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Information
Publisher:
Springer Verlag, Singapore
Format:
Paperback
Number of pages:
None
Language:
en
ISBN:
9789811500480
Publish year:
2020
Publish date:
Oct. 2, 2020