Machine Learning-Based Modelling in Atomic Layer Deposition Processes
(Author) Oluwatobi Adeleke
Format:
Hardcover
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This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
Information
Publisher:
Taylor & Francis Ltd
Format:
Hardcover
Number of pages:
None
Language:
en
ISBN:
9781032386706
Publish year:
2023
Publish date:
Dec. 15, 2023